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W3C Patent Policy
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Title
W3C Patent Policy
xhv:stylesheet
http://lodserver.iula.upf.edu/about/id/entity/http/www.w3.org/StyleSheets/TR/base.css
og:id
10150251562090017
content
http://lodserver.iula.upf.edu/about/id/entity/http/www.w3.org/Consortium/Patent-Policy-20040205/#content
links to
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-Requirements
http://www.w3.org/Consortium/Legal/copyright-software
http://www.w3.org/Consortium/Patent-Policy/
http://www.w3.org/
http://www.csail.mit.edu/
http://www.keio.ac.jp/
http://www.w3.org/Consortium/Legal/ipr-notice#Copyright
http://www.ercim.org/
http://www.w3.org/Consortium/Legal/ipr-notice#Legal_Disclaimer
http://www.w3.org/Consortium/Legal/ipr-notice#W3C_Trademarks
http://www.w3.org/Consortium/Legal/copyright-documents
http://www.w3.org/Consortium/Patent-Policy-20040205/
http://www.w3.org/Consortium/Patent-Policy-20040205/#def-essential
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-Disclosure
http://www.rfc-editor.org/rfc/rfc2119.txt
http://www.w3.org/2004/02/05-pp-transition
http://www.w3.org/Consortium/Process
http://www.w3.org/Consortium/Patent-Policy-20030520.html
mailto:djweitzner@w3.org
http://www.w3.org/Consortium/Patent-Policy-20040205/errata.html
http://www.w3.org/Consortium/Patent-Policy-20040205/translations.html
https://www.w3.org/Consortium/Patent-Policy-20170801/
http://www.w3.org/2001/ppwg/
http://www.w3.org/Consortium/Patent-Policy-20040205/#ref-PROCESS
mailto:www-patentpolicy-comment@w3.org
http://lists.w3.org/Archives/Public/www-patentpolicy-comment/
http://www.w3.org/2001/ppwg/patent-policy-errata.html
http://www.w3.org/Consortium/Patent/
http://www.w3.org/Consortium/Patent-Policy-20040205/#Abstract
http://www.w3.org/Consortium/Patent-Policy-20040205/#Status
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-Overview
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-Licensing
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-Obligations
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-W3C-RF-license
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-non-participants
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-submissions
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-invited
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-Exclusion
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-exclusion-with
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-exclusion-resign
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-join
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-exclude-app
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-exclude-mech
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-disclosure-requirements
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-disclosure-exemption
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-disclosure-requests
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-disclosure-contents
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-published
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-pending
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-good-faith
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-disclosure-timing
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-disclosure-termination
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-disclosure-invite
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-disclosure-public
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-Exception
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-PAG-formation
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-PAG-post-Recommendation
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-PAG-composition
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-PAG-procedures
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-PAG-procedures-timing
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-PAG-procedures-charter
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-PAG-conclude
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-PAG-conclude-possible
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-PAG-conclude-outcome
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-PAG-conclude-alternate
http://www.w3.org/Consortium/Patent-Policy-20040205/#def-essential-definition
http://www.w3.org/Consortium/Patent-Policy-20040205/#def-essential-exclusions
http://www.w3.org/Consortium/Patent-Policy-20040205/#def-essential-requirements
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-References
http://www.w3.org/Consortium/Patent-Policy-20040205/#sec-acknowledgments
http://www.w3.org/Consortium/Patent-Policy-20040205/#def-RF
http://www.w3.org/2003/12/Process-20031224/submission.html
http://www.w3.org/2003/12/Process-20031224/tr.html#first-wd
http://www.w3.org/2003/12/Process-20031224/tr.html#RecsW3C
http://www.w3.org/2003/12/Process-20031224/tr.html#RecsWD
http://www.w3.org/2003/12/Process-20031224/tr.html#last-call
http://www.w3.org/2003/12/Process-20031224/policies.html#Consensus
http://www.w3.org/Consortium/Patent-Policy-20040205/#ref-KEYWORDS
http://www.w3.org/2004/02/Process-20040205/
http://www.w3.org/TR/patent-practice
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Subject
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http://lodserver.iula.upf.edu/about/id/http/www.w3.org/Consortium/Patent-Policy-20040205/
is
topic
of
http://lodserver.iula.upf.edu/about/id/http/www.w3.org/Consortium/Patent-Policy-20040205/
is
container of
of
http://lodserver.iula.upf.edu/about/id/http/www.w3.org/Consortium/Patent-Policy-20040205/
is
patent policy
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http://lodserver.iula.upf.edu/about/id/entity/http/www.w3.org/2010/02/rdfa/
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